In the Chip War, Export Bans Have Worked. But We're Still Losing Ground

US export controls on advanced EUV lithography have been circumvented by China using older DUVi machines and a multi-patterning technique to produce near-frontier 5nm and 7nm chips. Backed by state subsidies, Chinese firms like SMIC are scaling this expensive but effective method, with a proposed US law, the MATCH Act, now aiming to restrict the essential maintenance and parts needed for these older machines.

This Wire brief sits within Fusion42's coverage of Semiconductors.